Microfabrication techniques that allow a fine 3-dimensional spatial control are revolutionizing the ways we design functional microdevices. By combining the possibility of obtaining complex architectures with high reproducibility and fast-throughput, researchers from diverse fields and backgrounds are pushing the boundaries of micromachinery, photonics, surface design, microrobotics, and biomedical sciences. Multi-photon lithography (also known as direct laser writing) is an established technique that combines the advantages of 3D-printing with sub-micron resolution. Recent developments have shown the potential of this technology to realize structures with unprecedented complexity, innovative functionalities, and dynamic functions. To achieve this, focus has been divided between material and method. Material scientists have achieved significant development of functional photoresists, which encompasses nanomaterial inclusion, photoinitiators with enhanced two-photon absorption and biocompatibility, and soft and responsive hydrogels. Concurrently, greater understanding of reaction mechanisms, computational analysis, and development of optical systems, have made considerable inroads in extending the limits of resolution, fabrication speed, and application. This symposium aims to congregate scientists working in the broader direct laser writing field, to document recent progress, and to critically analyze the opportunities and challenges for the future.
Symposium Organizers
Virgilio Mattoli
Istituto Italiano di Tecnologia
Center for Materials Interfaces
Italy
Eva Blasco
Heidelberg University
Centre for Advanced Materials
Germany
Larisa Florea
Trinity College Dublin
School of Chemistry & AMBER, the SFI Research Centre for Advanced Materials and BioEngineering Research
Ireland
Shlomo Magdassi
The Hebrew University of Jerusalem
Casali Center, Institute of Chemistry
Israel